Tantalum Sputtering Target for Semiconductor Integrated Circuits

Tantalum Sputtering Target for Semiconductor Integrated Circuits

Ta sputtering targets 

NRC04S Tantalum Sputtering Target is famous of its uniform microstructure and specific texture control, enable a perfect thin-film coating in Semiconductor Integrated Circuits industry, and have been proven by market. 

1. Purity of NRC04S Tantalum Sputtering Target

   Purity ≧99.99% (4N)

   For detailed chemical composition data, please contact us.  

2. Grain Size of Tantalum Sputtering Target

   Extremely Good for Semiconductor Integrated Circuits industry (very sure).

3. Surface Roughness Ra≤2.03μm, Flatness ≤0.2mm. (or per your spec)

4. Sample order of any quantity is availiable. 

5. Besides Tantalum Sputtering Target, we also supply other metal-based sputtering targets.