Sputtering Target for Thin-Film Coating

Sputtering Target for Thin-Film Coating

Target materials: Mo, W, Ta, Nb, Ti, Ni, Al, Cr

Sputtering target is now very popular used in thin-film coating process in semiconductor integrated circuits, LCD/OLED, data storage, optical thin-film coating and so on. The uniform microstructure and specific texture design, enable our sputtering target a perfect deposition performance. 

1. Supply Scope of Sputtering Target

    Mo - Molybdenum and its alloy

    W   - Tungsten and its alloy

    Ta   - Tantalum

    Nb  - Niobium

    Ti    - Titanium

    Ni   - Nickel and its alloy

    Al   - Aluminum

    Cr  -  Chrome

2. Sputtering Target type

    Planar, Rotary/Tubular,  Monolithic

3. Purity

    Per spec.  

4. Grain size of Sputtering Target

    Per spec.

5. Texture of Sputtering Target

    Perfect texture for thin-film deposition